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40 (SCIE) Hyoun Woo Kim*, Nam Ho Kim, Annealing effect for structural morphology of ZnO film on SiO2 substrates, Materials Science in Semiconductor Processing 7 (2004.02~04) 1-6.
39 (SCIE) N. H. Kim, H. W. Kim*, Room temperature preparation of c axis oriented ZnO films on Si(100), SiO2, and ZnO substrates by rf magnetron sputtering, British Ceramic Transactions 103 (2004.02) 15-18.
38 (SCIE) Nam Ho Kim, Hyoun Woo Kim*, Room temperature growth of zinc oxide films on Si substrates by the RF magnetron sputtering, Materials Letters 58 (2004.02) 938-943.
37 (SCIE) Hyoun Woo Kim*, Nam Ho Kim, Chongmu Lee, Ji-ho Ryu, Nae Eung Lee, Very Low Temperature Growth of ZnO Thin Films on Si Substrates Using the Metalorganic Chemical Vapor Deposition Technique, Journal of the Korean Physical Society 44 (2004.01.15) 14-17.
36 (SCIE) Hyoun Woo Kim*, Nam Ho Kim, Influence of the substrate on the structural properties of sputter-deposited ZnO films, Physica Status Solidi (a) 201 (2004.01) 235-238.
35 (SCIE) Hyoun Woo Kim*, Effect of surface carbon and oxygen on the structural quality of silicon homoepitaxial films, Journal of Materials Science 39 (2004.01) 361-363.
34 (SCIE) Hanseung Lee, Dukryel Kwon, Hyunah Park, Hyoun Woo Kim, Chongmu Lee*, Jaegab Lee, Rapid Thermal Annealing Treatment of Electroplated Cu Films, Journal of the Korean Physical Society 43 (2003.11.15) 841-846.
33 (SCIE) Hyoun Woo Kim*, Nam Ho Kim, Structural studies of room-temperature RF magnetron sputtered ZnO films under different RF powered conditions, Materials Science and Engineering: B 103 (2003.10.25) 297-302.
32 (SCIE) Hyoun Woo Kim*, Temperature Effect on Tungsten Etching using a Cl2/O2 Helicon Discharge, Journal of the Korean Physical Society 43 (2003.10.15) 526-528.
31 (SCIE) Byong-Sun Ju, Hyoun Woo Kim*, A concave-type structure of a Ru electrode capacitor fabricated by the reactive ion etching method, Microelectronic Engineering 70 (2003.10) 30-34.